Cleanroom
Modern cleanroom: cleanroom laboratories over 2 floors
Cleanroom class: ISO 4 – 6
White area: 700 m²
Micro- and nanotechnology made in Jena
With its clean room, the Leibniz Institute of Photonic Technology has excellent infrastructural facilities. Technologically, the entire process chain is covered, from design to mask production, lithography, layer production and structuring through to assembly and connection technology and analytics. The quality assurance of core processes is certified in accordance with DIN EN ISO 9001:2015.
Technology portfolio
Combinations of microlithographic top-down processes are available for the production of sensors and chip components:
- Metallic and dielectric thin-film technologies
- Microsystems technology (MEMS)
- Wafer-scale nanolithography based on electron beam lithography
Lithography
- Electron beam lithography
- Optical lithography
- Mask Aligner
- Maskless Aligner
- Wafer stepper
Thin film deposition
- Evaporation, sputtering, CVD, ALD
- Metals: Au, Ag, Al, Ti, Nb, Cr, …
- Dielectrics: SiO2, Al2O3, Si3N4, TiO2, …
Structuring
- Plasma etching (RIE, IBE, RIBE, ICP)
- Wet etching
- Lift Off
Microscopy and analytics
- SEM, FIB and optical microscopy
- AFM and ellipsometry
Structure and connection technology
- Sawing > Dicing
- Wire bonding
Cleanroom
- 700m² ISO class 4 (on 2 floors)
- From single chips up to 6″ wafer size