Description
Lateral resolution test for optical and UV microscopy The nanoscale linewidth / grating period standard consists of various grating structures that allow the linewidths to be calibrated and the resolution to be tested. This is possible, for example, for optical microscopy methods such as UVM (deep ultraviolet microscopy) and CLSM (confocal laser scanning microscopy), but also for AFM (atomic force microscopy). The structures etched in nanocrystalline silicon also allow astigmatism testing of these instruments. The high optical contrast of the structures up to the UV wavelength range enables them to be used in UV transmission and UV reflection microscopy as well as laser scanning microscopy. The grating types available are 1-dimensional line gratings (for x and y), 2-dimensional cross gratings and circular gratings. A separate single structure for CD determination is attached to one side of the 1-dimensional grating. The period values are 160, 200, 230, 260, 300, 400, 500, 700 nm, 1 µm and 4 µm, i.e. the structure widths are between 80 nm and 2 µm. With the exception of the larger 4 µm structures, each grating has an area of 10 × 10 µm².
Offer | Contact
Dr. Uwe Hübner
Head of the Competence Centre for Micro- and Nanotechnologies
Your contact for customised enquiries
Phone: +49 (0) 3641 · 206-126
Email: uwe.huebner@leibniz-ipht.de
