Description
High-performance absorber layer for a wide range of applications in the optical field. They are produced in a patented two-stage process (metastable atomic layer deposition) using physical vapour deposition and atomic layer deposition. The resulting structures consist of silicon dioxide nanowires (150 nm diameter) and small-scale silver nanoparticles. The first samples with a zinc oxide matrix are currently being researched and can be requested as experimental samples. The structures produced have a very high absorption of over 99.5 % in the range from 200 nm to 4000 nm. This absorption is stable over an opening angle of ± 60°. The absorption is based on plasmon resonance and scattering in the nanoscale structures. The structures are also highly resistant to the environment, humidity, heat, cold and reactive oxygen. Absorption: > 99.5 % (200 nm to 4000 nm // depending on layer thickness) Substrates: aluminium, glass, copper, brass, silicon, oxidised silicon, others on request Substrate morphology: planar, 3D structures on request Substrate size: 10 × 10 mm² to 150 mm wafer
Offer | Contact
Dr. Mario Ziegler
Your contact for optical functional layers
Phone: +49 (0) 3641 · 206-539
Email: mario.ziegler@leibniz-ipht.de
