High-resolution microscopy
TEM Hitachi HT7820
FEI Helios Nanolab G3 UC
High-resolution microscopy - Image 4
Various Systems with different Performance and Features available

High-resolution microscopy

  • High-resolution scanning electron microscopy (SEM) in the nanometre range
    • Various imaging modes for visualising topography and material contrast
    • Energy dispersive X-ray spectrometer (EDX) for analysis with high spatial resolution
  • Transmission electron microscopy (TEM) down to the (sub) nanometre range
    • STEM for bright and dark field imaging
    • Energy dispersive X-ray spectrometer (EDX) for analysis with high spatial resolution
    • Selected area aperture and beam stopper for structural analysis using electron diffraction
  • Atomic force microscopy (AFM)
    • Various imaging and contrast modes (topography, phase contrast, magnetic force microscopy)
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Description

  • Atomic force microscopy (AFM; Bruker Dimension Edge and others)
  • Scanning electron microscopy (SEM; FEI Helios Nanolab G3 UC, Jeol JSM-7900F, JEOL JSM-6700F, Tescan Lyra XMU)
  • Transmission electron microscopy (TEM, Hitachi HT7820, JEOL JEM-1400)
  • Nano-analysis (EDX) on SEM and TEM (Bruker XFlash 7)

Parameters

  • Structures can be resolved in the nm range
  • Highest surface sensitivity due to low-kV imaging
  • Sample sizes up to 6″ possible

Offer | Contact

Dellith

Dr. Jan Dellith
Your contact for material and microstructure analysis

Phone: +49 (0) 3641 · 206-104
Email: jan.dellith@leibniz-ipht.de

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