Thin film deposition

We offer technologies such as LPCVD, PECVD, ALD, PVD, as well as dry and wet oxidation to coat the surface of your samples with a variety of materials. The layer thicknesses produced in this way can range from a few nanometres to a few micrometres and layer systems can also be offered on request. It is also possible to produce stress-adapted coatings.

In principle, sample sizes in the lower millimetre range up to wafers with a diameter of 150 mm are possible.

Description

The following materials can be deposited by sputtering, thermal evaporation, ALD, PECVD/LPCVD and thermal oxidation to coat the surface of your samples with a variety of materials such as metals or non-metals:

Metallic/metalloid coatings

  • Al – Aluminium
  • AlSiCu – Aluminium-silicon-copper alloy
  • Ag – Silver
  • Au – Gold
  • AuPd – gold palladium
  • Bi – Bismuth
  • BiSb – Bismuth antimony
  • BiSbTe – Bismuth antimony telluride
  • Co – Cobalt
  • Cr- Chromium
  • Cu – Copper
  • Nb – Niobium
  • Ni – Nickel
  • NiCr – Nickel chromium
  • NiCrSi – Nickel-Chromium-Silicon alloy
  • Pt – Platinum
  • Sb – Antimony
  • Ti – Titanium
  • WTi – Tungsten titanium

Dielectric layers

  • AlN – Aluminium nitride
  • Al2O3 – Alumina
  • MgO – Magnesium oxide
  • NbOx – Niobium oxide
  • SiN – Silicon nitride
  • SiO2 – Silicon oxide
  • SiON – Silicon oxynitride
  • TiO2 – Titanium oxide

Others

  • C – Carbon
  • aSi – amorphous silicon
  • NbN – Niobium nitride
  • TiN – Titanium nitride
  • TiO2 – Titanium oxide
  • Other materials are available on request. Please contact us.

If the material or alloy you require is not listed, please contact us for further information and a customised quotation.

Offer | Contact

Ziegler

Dr. Mario Ziegler
Your contact for optical functional layers

Phone: +49 (0) 3641 · 206-539
Email: mario.ziegler@leibniz-ipht.de