Description
- Fine ion beam (FIB)
- FEI Helios Nanolab G3 UC (Ga+, 30keV, 50nA)
- Tescan Lyra XMU (Ga+, 30keV, 10nA)
- Ion beam etching
- JEOL IB-9010CP (Ar+; 6keV; 150 µA)
- High vacuum evaporation
- Leica ACE600 with C-filament
- Sputter Coater
- BalTec Med20 (Cr, Ta, Pt, Au)
Offer | Contact
Dr. Jan Dellith
Your contact for material and microstructure analysis
Phone: +49 (0) 3641 · 206-104
Email: jan.dellith@leibniz-ipht.de









